B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD).
采用固体三氧化二硼，用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
B-doped diamond films were grown on graphite substrates by hot filament assisted CVD method (HFCVD). The dopant was solid B_2O_3.
采用固体三氧化二硼，用热丝辅助化学气相沉积法在石墨衬底上沉积了掺硼金刚石涂层。
The results showed as the following: The content of graphite as loading agent and the sequence of loading graphite and the sample to the filament affect the boron isotopic ratios.
具体结论如下： 石墨发射剂的量和涂样顺序对硼同位素比值的测定有一定的影响。
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